G. Wang (US) Sandia National Laboratories
Sandia National LaboratoriesAuthor Of 1 Presentation
(SS LDNP) Special Symposium on Low Dimensional and Nanostructured Photonics
ThF1.2 - TOP-DOWN ETCH PROCESSES FOR III-NITRIDE NANOPHOTONICS
Presentation Type
Contributed Submission
Authors
Date
10/03/2019
Time
08:30 AM - 09:45 AM
Room
La Vista C
Duration
15 Minutes
Lecture Time
09:00 AM - 09:15 AM
Abstract
Abstract
Three-dimensional etch process in III-nitrides remain underdeveloped compared to other materials systems due to their apparent inertness to wet etchants. Here, we describe our recent work towards three-dimensional etching of III-nitride nano- and micro-structures using a two-step dry plus wet etch top-down approach.
Presenter Of 1 Presentation
(SS LDNP) Special Symposium on Low Dimensional and Nanostructured Photonics
ThF1.2 - TOP-DOWN ETCH PROCESSES FOR III-NITRIDE NANOPHOTONICS
Presentation Type
Contributed Submission
Authors
Date
10/03/2019
Time
08:30 AM - 09:45 AM
Room
La Vista C
Duration
15 Minutes
Lecture Time
09:00 AM - 09:15 AM
Abstract
Abstract
Three-dimensional etch process in III-nitrides remain underdeveloped compared to other materials systems due to their apparent inertness to wet etchants. Here, we describe our recent work towards three-dimensional etching of III-nitride nano- and micro-structures using a two-step dry plus wet etch top-down approach.
Moderator Of 2 Sessions
10/02/2019
01:30 PM - 03:00 PM
El Mirador C East
Time
01:30 PM - 03:00 PM
10/02/2019
08:30 AM - 10:00 AM
La Vista C
Time
08:30 AM - 10:00 AM